DocumentCode :
2204044
Title :
Current conduction paths in GaN
Author :
Morkoç, Hadis ; Bask, A.A. ; Molnar, R. ; Jasinski, J. ; Weber, Z. Liliental
Author_Institution :
Virginia Commonwealth Univ., Richmond, VA, USA
fYear :
2003
fDate :
25-27 Aug. 2003
Firstpage :
100
Lastpage :
101
Abstract :
Studies current conduction using C-AFM on a variety of GaN samples grown by MBE and HVPE on sapphire, both before and after performing chemical etches to delineate defect structures. Samples employed both side ohmic contacts and a conventional Schottky barrier configuration. The results indicate that the major current conduction paths in forward direction below the threshold of the metal-semiconductor junction turn-on are associated with prismatic planes. The same is true for the reverse current case. The Schottky barrier experiments indicate the planarized surfaces exhibit much lower excess current.
Keywords :
III-V semiconductors; Schottky barriers; atomic force microscopy; electrical conductivity; etching; gallium compounds; ohmic contacts; semiconductor epitaxial layers; semiconductor-metal boundaries; surface roughness; wide band gap semiconductors; AFM; Al2O3; GaN; GaN sample; MBE; Schottky barrier; chemical etching; current conduction path; delineate defect structure; metal-semiconductor junction; ohmic contact; planarized surface current; sapphire; Atomic force microscopy; Chemicals; Conductivity; Etching; Fasteners; Gallium nitride; Molecular beam epitaxial growth; Rough surfaces; Schottky barriers; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductors, 2003. International Symposium on
Print_ISBN :
0-7803-7820-2
Type :
conf
DOI :
10.1109/ISCS.2003.1239925
Filename :
1239925
Link To Document :
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