DocumentCode :
2204670
Title :
Rare earth doped GaN electroluminescent devices
Author :
Steckl, A.J. ; Lee, D.S. ; Heikenfeld, J. ; Munasinghe, C. ; Pan, M. ; Wang, Y. ; Yu, Z. ; Park, J. ; Baker, C. ; Jones, R.
Author_Institution :
Lab. of Nanoelectron., Cincinnati Univ., OH, USA
fYear :
2003
fDate :
25-27 Aug. 2003
Firstpage :
147
Lastpage :
148
Abstract :
In this paper, we discuss the fabrication, operation and aplications of rare-earth-doped GaN electroluminescent devices (ELDs). GaN:RE ELDs. GaN:RE ELDs emit light due to impact excitation of the RE ions by hot carriers followed by radiative relaxation. By appropriately choosing the RE dopant, narrow line width emission can be obtained at selected wavelengths from the ultraviolet to the infrared. The deposition of GaN:RE layers is carried out primarily by MBE. GaN growth mechanism and optimization for RE emission are discussed based on RE concentration, growth temperature, and III-V ratio. We have investigated the optimum growth conditions of RE doped GaN phosphors.
Keywords :
III-V semiconductors; electroluminescent devices; erbium; europium; flat panel displays; gallium compounds; hot carriers; impurity distribution; molecular beam epitaxial growth; phosphors; semiconductor epitaxial layers; semiconductor growth; semiconductor thin films; thulium; wide band gap semiconductors; GaN growth mechanism; GaN:Er; GaN:Eu; GaN:Tm; III-V ratio; flat panel displays; growth temperature; hot carriers; impact excitation; infrared emission; narrow line width emission; radiative relaxation; rare earth doped GaN electroluminescent device; rare earth doped GaN phosphors; ultraviolet emission; Electroluminescent devices; Erbium; Gallium nitride; Light emitting diodes; Optical materials; Photonic band gap; Prototypes; Semiconductor materials; Stimulated emission; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductors, 2003. International Symposium on
Print_ISBN :
0-7803-7820-2
Type :
conf
DOI :
10.1109/ISCS.2003.1239949
Filename :
1239949
Link To Document :
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