• DocumentCode
    2204712
  • Title

    Characteristics of pulsetrain-burst machining

  • Author

    Evans, R.T. ; Camacho-Lopez, S. ; Marjoribanks, R.S.

  • Author_Institution
    Dept. of Phys., Toronto Univ., Ont., Canada
  • fYear
    2002
  • fDate
    26-30 May 2002
  • Firstpage
    111
  • Abstract
    Summary form only given, as follows. The discovery of ultrafast-laser pulsetrain-burst machining at the University of Toronto has prompted new research into the physics involved in this regime of laser-matter interactions. Using the oscillator output of the Toronto FCM-CPA laser system we have been able to explore the effects of machining with a train of up to 400 1.2 ps pulses at a repetition rate of 133MHz. Pulsetrain burst machining has advantages over single pulse and CW laser machining. These include that drilling of holes at fluencies that would cause cracking or other negative thermal effects seen when using the other sources. Since the original work on this topic, which included the characterization of morphology of the drilled holes, we have further examined the physics behind this and conventional ultrafast laser machining by varying different parameters of the micromachining system. The technique is particularly useful for laser-material processing of brittle materials, especially glasses. We will describe the optical and thermal mechanisms behind hole-depth saturation in metals; part of which we believe is due to a loss of coherence caused by the pulse propagating down a multimode wave guide. We also will describe the connection between these mechanisms and our measurements of differential etch-rates.
  • Keywords
    laser beam machining; micromachining; optical pulse generation; 1.2 ps; 133 MHz; FCM-CPA laser system; brittle materials; glasses; hole drilling; hole morphology; hole-depth saturation; laser-matter interactions; loss of coherence; metals; micromachining; optical mechanisms; thermal mechanisms; ultrafast-laser pulsetrain-burst machining; Drilling; Glass; Laser theory; Machining; Micromachining; Morphology; Optical materials; Optical pulses; Oscillators; Physics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
  • Conference_Location
    Banff, Alberta, Canada
  • Print_ISBN
    0-7803-7407-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2002.1030271
  • Filename
    1030271