DocumentCode :
2204714
Title :
Pulsed microwave discharge in gas mixtures N/sub 2//O/sub 2//NO: experimental study and modeling
Author :
Baeva, M. ; Gier, H. ; Pott, A. ; Uhlenbusch, J.
Author_Institution :
Inst. of Laser & Plasma Phys., Dusseldorf Univ., Germany
fYear :
2000
fDate :
4-7 June 2000
Firstpage :
156
Abstract :
Summary form only given. The discharge chamber is operated at a mode with a resonance frequency near 2.46 GHz. The microwave field in the cavity is sufficient for breakdown at atmospheric pressure. The plasma burns in a quartz tube supported inside the microwave cavity. A commercial magnetron of the type Toshiba 2M137 is driven by a pulsed power supply to obtain pulse durations of several microseconds up to 200 /spl mu/s and repetition rates up to 100 kHz. The peak microwave power is 3.6 kW. The purpose of the work is to study the production/reduction of NO/sub x/ components by means of a pulsed microwave discharge. The discharge is operated in N/sub 2//O/sub 2//NO mixtures at flow rates of 15-30 standard liter per minute. Contrary to CW operated microwave discharges, pulsed systems show strong non-thermal behavior. Gas temperatures of 500-1000 K and vibrational temperatures of about 1000 K are observed. The mean electron temperature is about 1-2 eV.
Keywords :
gas mixtures; high-frequency discharges; nitrogen; nitrogen compounds; oxygen; plasma chemistry; plasma simulation; 1 to 2 eV; 1.6 kW; 100 kHz; 2.46 GHz; 200 mus; 500 to 1000 K; N/sub 2/-O/sub 2/-NO; N/sub 2/-O/sub 2/-NO gas mixtures; Toshiba 2M137 type magnetron; atmospheric pressure; breakdown; discharge chamber; flow rates; gas temperatures; mean electron temperature; microwave cavity; microwave field; modeling; nonthermal behavior; operating mode; plasma burning; production; pulse durations; pulsed microwave discharge; pulsed power supply; quartz tube; reduction; repetition rates; resonance frequency; vibrational temperatures; Atmospheric-pressure plasmas; Electrons; Gases; Nuclear and plasma sciences; Plasma density; Plasma temperature; Pulsed power supplies; Raman scattering; Semiconductor process modeling; Spectroscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5982-8
Type :
conf
DOI :
10.1109/PLASMA.2000.854839
Filename :
854839
Link To Document :
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