• DocumentCode
    2204764
  • Title

    A high power microwave-driven plasma torch

  • Author

    Read, Michael ; Kremer, Michael ; Oakes, D. ; Gelb, A.

  • Author_Institution
    Phys. Sci. Inc., Alexandria, VA, USA
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    156
  • Abstract
    Summary form only given. A plasma torch driven by either 2450 MHz or 915 MHz microwave radiation has been developed by PSI. The operates with internal pressures ranging from /spl sim/0.1 ATM to 12 ATM, and into both air and vacuum environments. It runs with a wide variety of gases, including N/sub 2/, air, O/sub 2/, SF/sub 6/, NF/sub 3/, CF/sub 4/, Cl/sub 2/ and He. The output of the torch is in the form of a jet with a measured temperature of 2000/spl deg/C-3000/spl deg/C. Devices at 2450 MHz and 915 MHz have been realized with powers to 5 kW and 16 kW, respectively. 915 MHz torches to 75 kW are planned. Measurements of the output jet show a high degree of dissociation for many gases, including SF, and oxygen. About 75% dissociation has been achieved with SF/sub 6/ resulting in a fluorine atom fluence of 3/spl times/10/sup 21//s for 2 kW operation. The high fluence output of the torch is attractive for many semiconductor processing applications. Details of the torch, its operation, and measurements of the output jet will be presented, as will comparisons with the results of modeling.
  • Keywords
    plasma jets; plasma pressure; plasma temperature; plasma torches; 0.1 to 12 atm; 16 kW; 2 kW; 2000 to 3000 C; 2450 MHz; 5 kW; 75 kW; 915 MHz; Cl/sub 2/; He; N/sub 2/; NF/sub 3/; O/sub 2/; SF/sub 6/; air; degree of dissociation; fluence output; fluorine atom fluence; high power microwave-driven plasma torch; internal pressures; methyl tetrafluoride; microwave radiation; modeling; output jet temperature; powers; semiconductor processing applications; tetrafluoromethane; vacuum environments; Atomic measurements; Gases; Helium; Noise measurement; Nuclear and plasma sciences; Plasma temperature; Semiconductor process modeling; Sulfur hexafluoride; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854841
  • Filename
    854841