Resilient Batch-Fabricated Planar Arrays of Miniaturized Langmuir Probes for Real-Time Measurement of Plasma Potential Fluctuations in the HF to Microwave Frequency Range

We report the design, fabrication, and characterization of miniaturized, flush-mounted Langmuir probe arrays for RF diagnosis of plasmas in the HF to microwave range of frequencies. We developed probes of radii ≥125 μm by electroless nickel metallization of ultrasonically drilled through-substrate vias. Planar arrays with as many as 25 probes spaced 1.6 mm apart (39 probes/cm2) in Pyrex, silicon carbide, and alumina substrates were produced. The sensor system was built to have a frequency response between 2 MHz and 3 GHz, and a probe impedance greater than or within close range of the plasma sheath impedance for plasma densities ≥1016 m^-3. We characterized a self-biasing nickel probe part of a 2×2 array with alumina substrate using a high-density magnetized helicon plasma source; we found that the measurement of the plasma potential from the MEMS probe compares well with independent measurements using a hot emissive probe and an ion sensitive probe. The sensor technology can be used to monitor plasma-based manufacturing systems, plasma-based energy generation systems, and as on-board plasma diagnostics in spacecraft including nanosatellites.