DocumentCode :
2204995
Title :
A comparison of dry plasma and wet chemical passivation of GaSb photodiodes
Author :
Bhagwat, Vinay ; Langer, J.P. ; Bhat, LB ; Dutta, P.S. ; Refaat, Tamer ; Abedin, M. Nurul
Author_Institution :
Dept. of Electr. Comput. & Syst. Eng., Rensselaer Polytech. Inst., Troy, NY, USA
fYear :
2003
fDate :
25-27 Aug. 2003
Firstpage :
179
Lastpage :
180
Abstract :
In this paper, the effect of ammonium sulfide passivation on the wet etched sample is reported. The device performance in terms of leakage current breakdown voltage, zero bias resistance area product and responsivity for the diodes is reviewed.
Keywords :
III-V semiconductors; electric breakdown; electric resistance; etching; gallium compounds; leakage currents; passivation; photodiodes; GaSb; GaSb photodiodes; ammonium sulfide passivation; breakdown voltage; dry plasma passivation; leakage current; semiconductor diodes; wet chemical passivation; wet etching; zero bias resistance; Argon; Chemicals; Diodes; Leakage current; Passivation; Photodiodes; Plasma applications; Plasma chemistry; Plasma devices; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductors, 2003. International Symposium on
Print_ISBN :
0-7803-7820-2
Type :
conf
DOI :
10.1109/ISCS.2003.1239964
Filename :
1239964
Link To Document :
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