Title :
Application of radio-frequency plasma to chemical reactions
Author :
Protasevich, E.T. ; Shishkovsky, V.I.
Author_Institution :
Tomsk Politechnical Univ., Russia
Abstract :
Summary form only given, as follows. For manufacture of ultradisperse powder (UDP) oxides, the plasma chemistry decomposition of solutions and the developed installation with a capacity of 10 kW, are described. The basic unit of the given installation is plasma chemistry reactor with RF-plasmatron. The structure of the installation includes unit of submission of raw material and the electrofilter for gathering UDP oxides. The RF-plasmatron may carry out function not only the generator of plasma, but also a plasma chemistry reactor when the heat-carrier and reagents move in the reactor through system of submission.
Keywords :
plasma chemistry; plasma diodes; plasma materials processing; powder technology; pyrolysis; RF-plasmatron; atomizers; disperse materials; electrofilter; plasma chemistry decomposition; plasma chemistry reactor; ultradisperse oxide powders; Chemicals; Inductors; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Powders; Radio frequency; Thermal spraying; Zirconium;
Conference_Titel :
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location :
Banff, Alberta, Canada
Print_ISBN :
0-7803-7407-X
DOI :
10.1109/PLASMA.2002.1030285
