Application of radio-frequency plasma to chemical reactions

Author

Protasevich, E.T. ; Shishkovsky, V.I.

Author_Institution

Tomsk Politechnical Univ., Russia

fYear

2002

fDate

26-30 May 2002

Firstpage

118

Abstract

Summary form only given, as follows. For manufacture of ultradisperse powder (UDP) oxides, the plasma chemistry decomposition of solutions and the developed installation with a capacity of 10 kW, are described. The basic unit of the given installation is plasma chemistry reactor with RF-plasmatron. The structure of the installation includes unit of submission of raw material and the electrofilter for gathering UDP oxides. The RF-plasmatron may carry out function not only the generator of plasma, but also a plasma chemistry reactor when the heat-carrier and reagents move in the reactor through system of submission.

Keywords

plasma chemistry; plasma diodes; plasma materials processing; powder technology; pyrolysis; RF-plasmatron; atomizers; disperse materials; electrofilter; plasma chemistry decomposition; plasma chemistry reactor; ultradisperse oxide powders; Chemicals; Inductors; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Powders; Radio frequency; Thermal spraying; Zirconium;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on

Conference_Location

Banff, Alberta, Canada

Print_ISBN

0-7803-7407-X

Type

conf

DOI

10.1109/PLASMA.2002.1030285

Filename

1030285