Vacuum arc technique TAMEK: broad metal ion, plasma and electron beams generation

This paper presents a review of vacuum arc facilities to be as injectors for metal ion accelerators. A vacuum arc in different modes: (1) arc current I_arc=2-50 A, pulse duration t_p=10 μs to 20 ms; (2) I_arc=20-100 A, t_p=50-1000 μs; (3) I_arc=100-2000 A, t_p=100-2000 μs; and (4) I_arc=10-100 kA, t_p=1-10 μs were investigated as metal ion injectors. The metal flows generated by cathode spots are expanded for diameters of 10-50 cm, and then deposited on the grounded target, or post accelerated between grids at U_accel =10-120 kV. On the basis of such injectors the series of TAMEK (Technological Accelerator of Metal Ion and Electron Kit) sources were investigated with metal ion current from I_i>0.01 A, pulse duration up to 20 ms, to I_i<5 kA, t_p=1-5 μs. Any from the following surface (of metals, ceramics, glass, etc.) treatment modes: metal ion deposition, high intensive metal ion implantation, ion mixing, ion beam assisted deposition, high power metal ion beam irradiation, or electron beam irradiation are implemented by TAMEK sources. These results are also presented