• DocumentCode
    2205457
  • Title

    Design of SiGe/Si heterojunction bipolar transistor for RF mixer application

  • Author

    Wu, You-Lin ; Yin-Hsin, H. ; Tian-Shuan, L. ; Hwang, Huey-liang

  • Author_Institution
    Deparment of Electr. Eng., Nat. Chi-Nan Univ., Nantou, Taiwan
  • Volume
    1
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    230
  • Abstract
    The design and simulation of NPN SiGe/Si heterojunction bipolar transistors (HBTs) suitable for RF mixer application are addressed. The feasibility of using the computer to simulate extensively from the fabrication process to the circuit application is also investigated. The process simulator TSUPREM, rather than the actual measured data, was used to obtain the doping profiles of the SiGe/Si HBTs, which were then input to the MEDICI 2D simulator to simulate device characteristics. The influence of Ge profiles, doping concentrations and device geometries on the DC and AC performances of the SiGe/Si HBTs are simulated. Base on simulation results, an optimum SiGe/Si HBT suitable for RF mixer application was determined. The Gummel-Poon model parameters extracted from the optimized HBT are then used in the analysis of a Gilbert-cell mixer circuit operated at 2.45 GHz by the ADS high-frequency circuit design tool
  • Keywords
    Ge-Si alloys; UHF bipolar transistors; UHF mixers; digital simulation; doping profiles; elemental semiconductors; heterojunction bipolar transistors; semiconductor device models; semiconductor materials; semiconductor process modelling; silicon; 2.45 GHz; AC performances; ADS high-frequency circuit design tool; DC performances; Ge profiles; Gilbert-cell mixer circuit; Gummel-Poon model parameters; HBTs; MEDICI 2D simulator; NPN SiGe/Si heterojunction bipolar transistors; RF mixer application; SiGe-Si; SiGe/Si heterojunction bipolar transistor; design; device geometries; doping concentrations; doping profiles; fabrication process; process simulator TSUPREM; simulation; Application software; Circuit simulation; Computational modeling; Computer simulation; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Medical simulation; Radio frequency; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    0-7803-6520-8
  • Type

    conf

  • DOI
    10.1109/ICSICT.2001.981462
  • Filename
    981462