DocumentCode :
2205457
Title :
Design of SiGe/Si heterojunction bipolar transistor for RF mixer application
Author :
Wu, You-Lin ; Yin-Hsin, H. ; Tian-Shuan, L. ; Hwang, Huey-liang
Author_Institution :
Deparment of Electr. Eng., Nat. Chi-Nan Univ., Nantou, Taiwan
Volume :
1
fYear :
2001
fDate :
2001
Firstpage :
230
Abstract :
The design and simulation of NPN SiGe/Si heterojunction bipolar transistors (HBTs) suitable for RF mixer application are addressed. The feasibility of using the computer to simulate extensively from the fabrication process to the circuit application is also investigated. The process simulator TSUPREM, rather than the actual measured data, was used to obtain the doping profiles of the SiGe/Si HBTs, which were then input to the MEDICI 2D simulator to simulate device characteristics. The influence of Ge profiles, doping concentrations and device geometries on the DC and AC performances of the SiGe/Si HBTs are simulated. Base on simulation results, an optimum SiGe/Si HBT suitable for RF mixer application was determined. The Gummel-Poon model parameters extracted from the optimized HBT are then used in the analysis of a Gilbert-cell mixer circuit operated at 2.45 GHz by the ADS high-frequency circuit design tool
Keywords :
Ge-Si alloys; UHF bipolar transistors; UHF mixers; digital simulation; doping profiles; elemental semiconductors; heterojunction bipolar transistors; semiconductor device models; semiconductor materials; semiconductor process modelling; silicon; 2.45 GHz; AC performances; ADS high-frequency circuit design tool; DC performances; Ge profiles; Gilbert-cell mixer circuit; Gummel-Poon model parameters; HBTs; MEDICI 2D simulator; NPN SiGe/Si heterojunction bipolar transistors; RF mixer application; SiGe-Si; SiGe/Si heterojunction bipolar transistor; design; device geometries; doping concentrations; doping profiles; fabrication process; process simulator TSUPREM; simulation; Application software; Circuit simulation; Computational modeling; Computer simulation; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Medical simulation; Radio frequency; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
0-7803-6520-8
Type :
conf
DOI :
10.1109/ICSICT.2001.981462
Filename :
981462
Link To Document :
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