DocumentCode :
2205769
Title :
Low pressure arcing on graphite: evidence of a columnar growth within the cathode spot
Author :
Kandah, M. ; Campbell, Malachy ; Meunier, Jean-Luc ; Coulombe, Stephane
Author_Institution :
Jordan Univ. of Sci. & Technol., Irbid, Jordan
fYear :
2002
fDate :
26-30 May 2002
Firstpage :
136
Abstract :
Summary form only given, as follows. Graphite cathode sources are used in arc ion plating devices for diamond-like film synthesis. A series of experimental studies and recent modeling results have been published on the problem of the detrimental co-emission of macro-particles from these sources. These suggested the emitted spherical carbon particles were a result of the local plasma conditions above the surface leading to the high pressure and temperature requirements for liquid droplet ejection, followed by a process similar to metallic electrodes. Contrary to this mechanism, this paper first presents SEM and Raman spectroscopy observations of carbon columnar growth layers formed on the cathode spot surface during the residence time of the carbon arc plasma. The emitted particles seem to originate from the cauliflower structure observed on the top layer of this growth. Cross sections of the cathode spot craters and film will be shown, with structure evolution passing from amorphous carbon at the base of the columnar structure to a dominating Raman peak of diamond at the top surface. Characteristics of the growth with varying source material morphology, their macro-particle emission behavior and arc mobility will be given together with modeling results of the plasma properties above the surface. Graphite materials showing important macro-particle emission show good correlation with decreasing spot mobility, increasing spot crater diameter and increasing growth layers. A self-sustained cathode spot model is used to evaluate the operating conditions at the plasma-surface interface.
Keywords :
Raman spectra; arcs (electric); cathodes; electron field emission; graphite; ion plating; plasma materials processing; scanning electron microscopy; sputtering; thermionic electron emission; C; Raman spectra; SEM; arc ion plating; cathode spot craters; cathode spot surface; cauliflower structure; columnar growth layers; detrimental co-emission; erosion rates; graphite cathode sources; local plasma conditions; low pressure arcing; macroparticles; plasma-surface interface; self-sustained cathode spot model; thermo-field electron emission conditions; Carbon dioxide; Cathodes; Electrodes; Plasma devices; Plasma properties; Plasma sources; Plasma temperature; Raman scattering; Spectroscopy; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location :
Banff, Alberta, Canada
Print_ISBN :
0-7803-7407-X
Type :
conf
DOI :
10.1109/PLASMA.2002.1030316
Filename :
1030316
Link To Document :
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