Title :
Harmonic content of electron energy distributions and excitation rates
Author :
Vasenkov, A. ; Sankaran, A. ; Kushner, M.J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
Abstract :
Summary form only given, as follows. Although low pressure (<10 s mTorr), high frequency (>MHz) inductively coupled plasmas (ICPs) are thought of as providing quasi-cw sources of excitation, harmonic excitation may occur, particularly for high threshold processes. This harmonic excitation results from modulation of the electron energy distribution (EED) due to both linear and non-linear processes. In this paper, the harmonic content of EEDs and excitation rates in low pressure ICPs will be discussed using results from a 2-dimensional plasma equipment model. The model uses a Monte Carlo Simulation (MCS) to resolve electron energy transport in self-consistently generated electromagnetic and electrostatic fields. During collection of statistics in the MCS, Fourier transforms in time are taken of the electron trajectories, binned according to space. The end results are Fourier coefficients of the time harmonics as a function of position and energy which can be used to reconstruct the time dependence of the EEDs.
Keywords :
Fourier transforms; Monte Carlo methods; harmonics; plasma collision processes; plasma materials processing; plasma nonlinear processes; plasma simulation; Fourier transforms in time; Lorentz forces; Monte Carlo simulation; collisional processes; electromagnetic fields; electron energy distribution; electron energy transport; electrostatic fields; excitation rates; harmonic excitation; high frequency inductively coupled plasmas; high threshold processes; linear processes; low pressure inductively coupled plasmas; nonlinear processes; self-consistently generated fields; skin depth; time dependence; time harmonics; two-dimensional plasma equipment model; Electromagnetic fields; Electromagnetic modeling; Electrons; Electrostatics; Energy resolution; Frequency; Plasma simulation; Plasma sources; Plasma transport processes; Statistics;
Conference_Titel :
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location :
Banff, Alberta, Canada
Print_ISBN :
0-7803-7407-X
DOI :
10.1109/PLASMA.2002.1030331