Title :
A Novel 2-D Capacitive Silicon Flow Sensor
Author :
Wei, Ze-Wen ; Qin, Ming ; Huang, Qing-An
Author_Institution :
Southeast Univ., Nanjing
Abstract :
A novel 2-D capacitive silicon flow sensor which can detect both air flow velocity and direction is presented in this paper. The sensor has a sensing disk that is connected with the anchor by "spring-like beam". The flow induced drag force makes the disk shift, and eventually changes the capacitance. The influences of the flow on the structure are analyzed by FEA. A fascination process based on anodic bonding and ICP (Inductive Coupled Plasma) etch is proved to be a valid one. The fabricated sensor is 4.8 mm in diameter and 0.12 mm in height, with 2.4 pF of initial capacitance in each quadrant. Wind flow velocity from 1 m/s to 10 m/s and flow direction angle of 360 degrees can be measured successfully. The experiment results show a reasonable agreement with the simulation.
Keywords :
capacitance; drag; elemental semiconductors; finite element analysis; flow measurement; flow sensors; silicon; sputter etching; 2-D capacitive silicon flow sensor; Si; air flow direction; air flow velocity; anodic bonding; capacitance; finite element analysis; flow induced drag force; inductive coupled plasma etching; sensing disk; Bonding; Capacitance; Capacitive sensors; Drag; Etching; Fluid flow measurement; Force sensors; Plasma applications; Silicon; Wind speed;
Conference_Titel :
Sensors, 2007 IEEE
Conference_Location :
Atlanta, GA
Print_ISBN :
978-1-4244-1261-7
Electronic_ISBN :
1930-0395
DOI :
10.1109/ICSENS.2007.4388544
