DocumentCode
2208188
Title
Probes in non-uniform plasma
Author
Oksuz, L. ; Hershkowitz, N. ; Lho, T.
Author_Institution
Dept. of Eng. Phys., Wisconsin Univ., Madison, WI, USA
fYear
2000
fDate
4-7 June 2000
Firstpage
191
Abstract
Summary form only given. Mach probes and Langmuir probes are investigated experimentally in a non-uniform, unmagnetized plasma, drifting in a wall presheath. A Mach probe consists of two single sided Langmuir probes back to back with an insulator between them. Two different probe diameter sets 0.125" and 0.375", (smaller than the ion collision length ∼3 cm at 1 mTorr) are used. The upstream side of the Mach probe (which faces the bulk plasma) indicated higher plasma potential than the local plasma potential in the absence of the probe. The plasma potential and density indicated by the upstream side of the Mach probe is almost the same plasma potential and density found an ion collision length (presheath length) from the probe. The downstream side of the Mach probe indicated lower plasma potential and density than the unperturbed local plasma potential and density. But the absolute value of the deviations from the local plasma potential and density were the same value for both sides of the Mach probe. The shadowing effect for the downstream side of the Mach probe is investigated when the probe is biased negatively and near the plasma potential. The potential and density profiles are also obtained by an emissive probe and a Langmuir probe near the upstream side and the downstream side of the Mach probe.
Keywords
Langmuir probes; plasma density; plasma probes; plasma sheaths; Mach probes; downstream side; emissive probe; insulator; ion collision length; local plasma potential; negatively biased probe; nonuniform plasma; plasma density; presheath length; probe diameter; single sided Langmuir probes; unmagnetized plasma; upstream side; wall presheath; Dielectrics; Fluorescence; Optical pulses; Plasma chemistry; Plasma density; Plasma measurements; Pollution measurement; Probes; Pulse measurements; Spatial resolution;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location
New Orleans, LA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5982-8
Type
conf
DOI
10.1109/PLASMA.2000.854986
Filename
854986
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