Title :
Generation of atmospheric pressure plasma using two chambers
Author :
Park, H. ; Muthuswamy, N. ; Dhali, S.K.
Author_Institution :
Southern Illinois Univ., Carbondale, IL, USA
Abstract :
Summary form only given, as follows. It has been shown that UV irradiation in an air discharge at atmospheric pressure results in an improvement in the uniformity of the discharge. We have used a dual chamber device to generate plasma in air at atmospheric pressure. A single power supply at 3 kHz is used to excite a discharge in both chambers. A low-pressure chamber is used to generate UV, which is coupled to the high-pressure region through a quartz dielectric. The UV from low-pressure region improves the atmospheric pressure discharge characteristics. Results of CCD camera pictures will be presented and compared with a dielectric-barrier discharge. Power and current measurements will be presented. The results show that a dual pressure discharge is capable of generating uniform plasma at atmospheric pressure and performs better than a dielectric-barrier discharge.
Keywords :
plasma diagnostics; plasma production; 1 atm; 3 kHz; CCD camera; UV irradiation; air discharge; atmospheric pressure discharge; atmospheric pressure plasma generation; dielectric-barrier discharge; dual chamber device; dual pressure discharge; low-pressure chamber; quartz dielectric; Atmospheric-pressure plasmas; Current measurement; Dielectrics; Plasma devices; Plasma materials processing; Plasma measurements; Plasma properties; Power supplies; Surface discharges; Voltage;
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
Print_ISBN :
0-7803-5982-8
DOI :
10.1109/PLASMA.2000.855019