Title :
Examination of emission mitigation protocols for power flow surfaces on 20-MA Z utilizing electrochemical processing, hydrogen firing, and vacuum firing
Author :
McKenney, J.L. ; Garrity, J.E. ; Gluth, J.W. ; Lobley, D.K. ; Romero, A.R. ; Spielman, R.B. ; Seamen, J.F. ; Stygar, W.A. ; Johnson, D.J. ; Renk, T.
Author_Institution :
Ktech Corp., Albuquerque, NM, USA
Abstract :
Summary form only given. Laboratory experiments were performed to study the effect of emission mitigation protocols used on 20-MA Z. These laboratory experiments were utilized to determine the viability of the methods employed on Z´s central convolute region load hardware. In addition, this examination is designed to be an aid in determining an experimental test matrix on Z. The convolute hardware´s material, comprised of stainless steel 304L, was determined to have varying emission properties when different methods were applied. The particular focus of the study centered on the sulfur levels inherent in the stainless steel alloy. The effects of electrochemical electropolishing, hydrogen firing, vacuum firing and gold coating on voltage standoff thresholds were studied. A second low sulfur metal, stainless steel 304L SCQ, was studied and compared to the results of the currently used stainless steel 304L alloy. The results of these studies will be presented.
Keywords :
Z pinch; coatings; electrochemistry; electrolytic polishing; heat treatment; stainless steel; surface treatment; 20 MA; Z pinch; central convolute region load hardware; electrochemical electropolishing; electrochemical processing; emission mitigation protocols; emission properties; gold coating; hydrogen firing; low sulfur metal; power flow surfaces; stainless steel 304L; stainless steel 304L SCQ; test matrix; vacuum firing; voltage standoff thresholds; Building materials; Firing; Hardware; Hydrogen; Iron alloys; Laboratories; Load flow; Materials testing; Protocols; Steel;
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
Print_ISBN :
0-7803-5982-8
DOI :
10.1109/PLASMA.2000.855029