DocumentCode :
2209921
Title :
The role of ion production on the physics of small diameter rod-pinch electron beam diodes
Author :
Swanekamp, S.B. ; Commisso, R.J. ; Cooperstein, G. ; Schumer, J.W. ; Maenchen, J.E. ; Menge, P.R. ; Oliver, Bryan V. ; Rose, David V. ; Welch, Dale R.
Author_Institution :
Div. of Plasma Phys., Naval Res. Lab., Washington, DC, USA
fYear :
2000
fDate :
4-7 June 2000
Firstpage :
231
Abstract :
Summary form only given. The rod pinch diode has shown promise in producing a small diameter (/spl sim/1 mm), high brightness (2-3 Roentgens@1 m, 1.8 MeV endpoint with 30 ns FWHM) X-ray source for flash radiography. Previous simulations and modeling have shown that the operation of these diodes is similar to a standard pinched-beam diode. At low voltages and currents, the self magnetic field can be ignored and the diode operates as a space-charge-limited cylindrical diode. However, at voltages high enough to exceed critical current, the self-magnetic field can no longer be ignored and the diode current is magnetically limited. In this magnetically limited regime the self-magnetic field pinches the beam to the end or the anode rod creating a very tightly pinched electron beam. In the paper, the particle-in-cell code MAGIC is used to study the role of ions on small diameter rod-pinch diodes. Where possible, the simulation results are compared directly to experiments and theoretical predictions.
Keywords :
X-ray production; electron beams; magnetic fields; pinch effect; plasma diodes; plasma simulation; radiography; 1 mm; 1.8 MeV; 30 ns; MAGIC code; X-ray source; anode rod; diameter rod-pinch diodes; diode; diode current; flash radiography; ion production; magnetically limited diode current; magnetically limited regime; pace-charge-limited cylindrical diode; particle-in-cell code; rod pinch diode; self magnetic field; self-magnetic field; small diameter rod-pinch electron beam diodes; standard pinched-beam diode; tightly pinched electron beam; Anodes; Brightness; Critical current; Diodes; Electron beams; Low voltage; Magnetic fields; Physics; Production; Radiography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5982-8
Type :
conf
DOI :
10.1109/PLASMA.2000.855062
Filename :
855062
Link To Document :
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