DocumentCode
2210451
Title
A model of teflon ablation in a pulsed plasma thruster
Author
Keidar, Michael ; Boyd, Iain D. ; Beilis, Isak I.
Author_Institution
Dept. of Aerosp. Eng., Michigan Univ., Ann Arbor, MI, USA
fYear
2000
fDate
4-7 June 2000
Firstpage
241
Abstract
Summary form only given, as follows. A kinetic model of the propellant ablation in a pulsed plasma thruster is developed. The model takes into account the non-free nature of ablation due to the presence of a high-density discharge plasma. The kinetic approach namely bi-modal distribution function was used to determine the parameters at the interface between the kinetic Knudsen layer and the hydrodynamic layer. By coupling the kinetic layer solution with the hydrodynamic non-equilibrium layer model an ablation rate was calculated. The model allows the calculation of ablation rate as a function of propellant surface temperature, plasma density and temperature, and in combination with a plasma discharge model self-consistently describes the electrical discharge in an electrothermal pulsed plasma thruster. An example of the calculated ablation rate as a function of plasma bulk density and Teflon surface temperature is shown.
Keywords
discharges (electric); plasma density; plasma devices; plasma kinetic theory; plasma materials processing; plasma temperature; Teflon surface temperature; ablation rate; bimodal distribution function; electrical discharge; electrothermal pulsed plasma thruster; high-density discharge plasma; hydrodynamic layer; hydrodynamic nonequilibrium layer model; kinetic Knudsen layer; kinetic approach; kinetic layer solution; kinetic model; nonfree nature; plasma bulk density; plasma density; plasma discharge model; plasma temperature; propellant ablation; propellant surface temperature; pulsed plasma thruster; teflon ablation; Aerospace engineering; Distribution functions; Electrothermal effects; Hydrodynamics; Kinetic theory; Laboratories; Plasma density; Plasma temperature; Propulsion; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location
New Orleans, LA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5982-8
Type
conf
DOI
10.1109/PLASMA.2000.855080
Filename
855080
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