• DocumentCode
    2210533
  • Title

    Microwave tunnel kiln for ceramic sintering

  • Author

    Sato, Mitsuhisa ; Mutoh, T. ; Shimotuma, T. ; Takayama, S. ; Mizuno, M. ; Hirai, Toshiya ; Ochiai, Toshihiko ; Kato, Kazuhiko ; Nakajima, Masahiro ; Sawada, Tsuyoshi ; Sato, Seiki

  • Author_Institution
    Nat. Inst. for Fusion Sci., Japan
  • fYear
    2002
  • fDate
    26-30 May 2002
  • Firstpage
    245
  • Abstract
    Summary form only given, as follows. A tunnel kiln heated only by microwaves has been developed. The industrial ceramics are sintered continuously in the roller hearth. The minimum sintering time is an hour which is shorter than the time in the fastest conventional tunnel kiln with electric heaters. The maximum processing rate is 50 kg/hour. The dimensions of the tunnel are 0.3 m /spl times/ 0.3 m cross section and 6 m length of heating zone. The 60 magnetron generates 53 kW in total at 2.45 GHz. The thickness of the double layer thermal insulating wall varied to get a temperature gradient from 500 degC at the entrance to 1300 degC at the top zone along the tunnel axis. The work pieces were carried with the speed at which the temperature of them can synchronize to that of the inner most tunnel wall to ensure the adiabatic thermal insulation criteria. The work pieces would have body heating uniformly by microwave. The kiln will be applicable to many kinds of ceramics just by tuning up the speed or microwave power.
  • Keywords
    ceramics; microwave materials; plasma materials processing; sintering; 1300 degC; 2.45 GHz; 500 degC; 53 kW; adiabatic thermal insulation criteria; body heating; ceramic sintering; double layer thermal insulating wall; electric heaters; magnetron; microwave power; microwave tunnel kiln; roller hearth; temperature gradient; Ceramics industry; Electromagnetic heating; Electromagnetic radiative interference; Frequency synchronization; Insulation; Kilns; Physics; Plasma temperature; Resistance heating; Slabs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
  • Conference_Location
    Banff, Alberta, Canada
  • Print_ISBN
    0-7803-7407-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2002.1030514
  • Filename
    1030514