• DocumentCode
    2211089
  • Title

    Reduction of nitrogen oxide using ammonia radical prepared by intermittent dielectric barrier discharge

  • Author

    Nagao, I. ; Yukimura, Ken ; Kambara, S. ; Maruyama, T.

  • Author_Institution
    Dept. of Electr. Eng., Doshisha Univ., Kyoto, Japan
  • fYear
    2002
  • fDate
    26-30 May 2002
  • Firstpage
    256
  • Abstract
    Summary form only given. The plasma processes have attracted attention because of their low instrumental costs and simple process, where the plasma-induced radicals efficiently convert NO/sub x/ into harmless gases such as N/sub 2/, O/sub 2/, and H/sub 2/O. This study used the method of radical injection, where the ammonia radicals were externally generated by dielectric barrier discharge in a separate chamber of a small volume through electron-impact dissociation and ionization, and were injected in NO/sub x/ gas to reduce the NO/sub x/ molecules. The method of radical injection is efficient in large-scale NO/sub x/ removal. NO in N/sub 2/ gas was reduced by the ammonia radicals, which were generated by flowing the NH/sub 3/ gas diluted with Ar gas through dielectric barrier discharge with one-cycle sinusoidal (OCS)-wave power source.
  • Keywords
    discharges (electric); electron impact excitation; electron impact ionisation; free radical reactions; nitrogen compounds; plasma chemistry; plasma collision processes; plasma materials processing; reduction (chemical); H/sub 2/O; N/sub 2/; NH/sub 3/; NH/sub 3/ radical; NO/sub x/; O/sub 2/; dielectric barrier discharge; electron-impact dissociation; electron-impact ionization; harmless gases; intermittent dielectric barrier discharge; low instrumental costs; one-cycle sinusoidal wave power source; plasma processes; plasma-induced radicals; radical injection; Argon; Costs; Dielectrics; Gases; Instruments; Ionization; Large-scale systems; Nitrogen; Plasmas; Power generation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
  • Conference_Location
    Banff, Alberta, Canada
  • Print_ISBN
    0-7803-7407-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2002.1030534
  • Filename
    1030534