DocumentCode :
2211141
Title :
A Vertical Hall Device in Standard Submicron CMOS Technology
Author :
Pascal, Joris ; Hébrard, Luc ; Kammerer, Jean-baptiste ; Frick, VIncent ; Blondé, Jean-Philippe
Author_Institution :
ULP Strasbourg, Strasbourg
fYear :
2007
fDate :
28-31 Oct. 2007
Firstpage :
1480
Lastpage :
1483
Abstract :
In order to lower the short circuit effect due to the measurement contacts, vertical Hall devices (VHD) are generally designed either in bulky N-type silicon or in the deep N-well of high-voltage CMOS technologies. In this last case, VHD can benefit from on chip circuitry for offset and 1/f noise reduction, but HVCMOS remains a costly technology. Recently, using spinning-current, a HVCMOS compatible VHD with a resolution of 76 muT over a 1.6 kHz bandwidth has been demonstrated. The VHD presented here is designed in the shallow N-well of a low cost 0.35 mum standard CMOS technology. Unlike conventional VHD, its measurement contacts are located outside the sensor active area. FEM simulations and experimental results show that the new geometry suppresses the short circuit effect and strongly reduces the intrinsic offset and noise. Thus, without any noise and offset reduction method, this new small VHD (63 mum2) reaches a resolution of 79 muT over a [5 Hz - 1.6 kHz] bandwidth.
Keywords :
1/f noise; Hall effect devices; finite element analysis; semiconductor device noise; sensors; 1-f noise; FEM simulations; bandwidth 1.6 kHz; chip circuitry; high-voltage CMOS technologies; offset reduction; sensor; short circuit effect; spinning current; vertical Hall device; Area measurement; Bandwidth; CMOS technology; Circuit noise; Circuit simulation; Costs; Noise reduction; Semiconductor device measurement; Silicon; Solid modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Sensors, 2007 IEEE
Conference_Location :
Atlanta, GA
ISSN :
1930-0395
Print_ISBN :
978-1-4244-1261-7
Electronic_ISBN :
1930-0395
Type :
conf
DOI :
10.1109/ICSENS.2007.4388694
Filename :
4388694
Link To Document :
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