Surface coating by combining double-pulse plasma with plasma-based ion implantation

Summary form only given. A newly developed coating system, named HPPC (Hybrid Pulse Plasma Coating) System, incorporates PBH (Plasma-Based Ion Implantation) with double-pulse plasma CVD which operates by synchronizing two pulses for gas feed and plasma generation. The effect of the double-pulse plasma on the uniformity of fragment-ion distributions in the plasma is described and is also experimentally confirmed by using a movable mass spectrometer. The experimental results show that the distributions are not consistent with that of the electron density and depend on the configuration of gas feed. Some coating tests with the HPPC system are also shown. A model die that has several concaves with different aspect ratios is used to study how deeply the concave surface is coated. A scratch test for film adhesion shows that the adhesion increases with the ion implantation energy at the interface-forming stage. It is shown that the HPPC system can uniformly and adhesively coat even three-dimensionally complicated surfaces with particular films like DLC (diamond like carbon) or metal oxides.