• DocumentCode
    2211222
  • Title

    Optical analysis of haze ratio and antireflection in structured thin film solar cell

  • Author

    Chao, C.C. ; Pan, Y.C. ; Wang, C.M. ; Chang, J.Y.

  • Author_Institution
    Dept. of Opt. & Photonics, Nat. Central Univ., Jhongli, Taiwan
  • fYear
    2010
  • fDate
    11-13 Aug. 2010
  • Firstpage
    56
  • Lastpage
    60
  • Abstract
    In this paper, the influence of the haze ratio and antireflection properties of the thin film solar cell with a periodic texture is theoretical investigated. Two different cases, Case 1 and Case 2, are compared. Case 1 shows an extremely high haze ratio of 97.4% while Case 2 shows a low reflectance of 0.3%. For the thickness of the a-Si:H layer is 100nm~400nm, the JSC of the antireflection case is higher than that of high haze ratio one. Until the thickness of the a-Si:H layer is increased to 500nm, the JSC of Case 1 is 20.5 mA/cm2 which is higher than Case 2.
  • Keywords
    antireflection coatings; periodic structures; solar cells; a-Si:H layer; antireflection properties; haze ratio; optical analysis; periodic texture; structured thin film solar cell; Gratings; Indium tin oxide; Optical films; Optical reflection; Photovoltaic cells; Reflectivity; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Electromagnetism and Student Innovation Competition Awards (AEM2C), 2010 International Conference on
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-6416-6
  • Type

    conf

  • DOI
    10.1109/AEM2C.2010.5578788
  • Filename
    5578788