DocumentCode
2211222
Title
Optical analysis of haze ratio and antireflection in structured thin film solar cell
Author
Chao, C.C. ; Pan, Y.C. ; Wang, C.M. ; Chang, J.Y.
Author_Institution
Dept. of Opt. & Photonics, Nat. Central Univ., Jhongli, Taiwan
fYear
2010
fDate
11-13 Aug. 2010
Firstpage
56
Lastpage
60
Abstract
In this paper, the influence of the haze ratio and antireflection properties of the thin film solar cell with a periodic texture is theoretical investigated. Two different cases, Case 1 and Case 2, are compared. Case 1 shows an extremely high haze ratio of 97.4% while Case 2 shows a low reflectance of 0.3%. For the thickness of the a-Si:H layer is 100nm~400nm, the JSC of the antireflection case is higher than that of high haze ratio one. Until the thickness of the a-Si:H layer is increased to 500nm, the JSC of Case 1 is 20.5 mA/cm2 which is higher than Case 2.
Keywords
antireflection coatings; periodic structures; solar cells; a-Si:H layer; antireflection properties; haze ratio; optical analysis; periodic texture; structured thin film solar cell; Gratings; Indium tin oxide; Optical films; Optical reflection; Photovoltaic cells; Reflectivity; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Electromagnetism and Student Innovation Competition Awards (AEM2C), 2010 International Conference on
Conference_Location
Taipei
Print_ISBN
978-1-4244-6416-6
Type
conf
DOI
10.1109/AEM2C.2010.5578788
Filename
5578788
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