• DocumentCode
    2211286
  • Title

    The corrosion properties of RF inductively coupled plasma nitrided stainless substrates

  • Author

    Chandan Kumar Chakrabarty

  • Author_Institution
    Coll. of Eng., Univ. Tenaga Nasional, Selangor, Malaysia
  • fYear
    2002
  • fDate
    26-30 May 2002
  • Firstpage
    261
  • Abstract
    Summary form only given. This paper presents the corrosion properties of RF inductively coupled plasma nitrided stainless steel substrates. A home-made low-frequency RF inductively coupled plasma source was used to perform the nitriding process. The processing parameters were carefully selected after considering the repeatability of the device. A nitrogen plasma operating in the H-mode was used for the nitriding process. Proper substrate bias was also applied during nitriding. Several stainless steel substrates were nitrided at different processing times. Investigations such as microhardness, XRD and EDAX tests were performed on the nitrided samples prior to corrosion testing. For corrosion testing, the electrochemical polarization method was used. In this method, the corrosion resistance properties were successfully characterized. Several results are presented in this paper to reveal the correlation of the nitriding times, the phases formed and surface hardness to the corrosion properties of the samples.
  • Keywords
    X-ray diffraction; corrosion resistance; microhardness; plasma materials processing; stainless steel; surface hardening; EDAX; H-mode; RF inductively coupled plasma nitrided stainless substrates; X-ray diffraction; corrosion properties; corrosion testing; electrochemical polarization method; low-frequency RF inductively coupled plasma source; microhardness; processing parameters; processing times; repeatibility; stainless steel substrates; substrate bias; surface hardness; Corrosion; Nitrogen; Plasma devices; Plasma materials processing; Plasma properties; Plasma sources; Radio frequency; Steel; Testing; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
  • Conference_Location
    Banff, Alberta, Canada
  • Print_ISBN
    0-7803-7407-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2002.1030542
  • Filename
    1030542