Title :
Solid state pulsed power systems for plasma applications
Author :
Gaudreau, M.P.J. ; Casey, J. Alec ; Mulvaney, J.M. ; Kempkes, M.A. ; Hawkey, T.J.
Author_Institution :
Diversified Technol. Inc., Bedford, MA, USA
Abstract :
Summary form only given. Diversified Technologies, Inc. (DTI) has developed and patented solid state technology to provide fast, high power opening and closing switches. These switches are modular, and can be combined in series and/or in parallel to provide a wide range of voltage, current, and power handling capabilities. To date, DTI has built solid state, hard switch pulsed power systems with at 1 kV to 160 kV, and peak power levels up to 70 MW, and capable of pulse frequencies from DC to 400 kHz. Initial applications of this capability have been for providing repetitive pulses of electrical power for RF amplifier systems (klystrons, TWTs, and gyrotrons) and for plasma processing. This paper describes the basic design and performance of these solid state modulators. Specific focus is placed on application of this pulsed power technology to plasma processes, such as plasma immersion ion implantation (PIII) for both semiconductors and metal treatment. Examples of specific system applications include the use of DTI modulators for high volume diamond-like coating (DLC) and plasma source ion implantation (PSII) processes in metal processing, and high voltage, high peak power(100 kV, 500 A) modulators for semiconductor process research and operations.
Keywords :
gyrotrons; ion implantation; klystrons; microwave power amplifiers; plasma applications; pulsed power switches; travelling wave amplifiers; 1 to 160 kV; 500 A; 70 MW; TWT; closing switches; gyrotrons; hard switch pulsed power systems; high volume diamond-like coating; klystrons; opening switches; plasma applications; plasma immersion ion implantation; plasma processing; plasma source ion implantation; pulsed power technology; semiconductor process operations; semiconductor process research; solid state pulsed power systems; solid state technology; Diffusion tensor imaging; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Plasma sources; Pulse amplifiers; Pulse power systems; Solid state circuits; Switches; Voltage;
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
Print_ISBN :
0-7803-5982-8
DOI :
10.1109/PLASMA.2000.855122