DocumentCode :
2211886
Title :
Investigation of mode transitions in a pulsed ICP system
Author :
Wei Guo ; DeJoseph, C.A.
Author_Institution :
Innovative Sci. Solutions Inc., Dayton, OH, USA
fYear :
2002
fDate :
26-30 May 2002
Firstpage :
273
Abstract :
Summary form only given, as follows. Mode transitions in a low pressure, repetitively pulsed, RF (13.56 MHz) excited, inductively coupled plasma (ICP) source were investigated by using current and voltage probes on the RF coil. In addition, time resolved Langmuir probe measurements of electron temperature, plasma potential, and plasma density were made during these mode transitions. A third diagnostics utilized a fast photomultiplier with narrow band filters to monitor time resolved plasma emission. Argon was used as a representative atomic gas while nitrogen was used as a representative molecular gas. Both pure gases and mixtures were used in the experiment. During a single RF pulse, the discharge was observed to run either capacitively coupled or change from capacitive to inductive mode. Once the transition was made to the inductive mode, that mode was active until the end of the pulse. The observed mode changes were a function of pulse width, RF power, gas pressure, and gas mixture. By comparing the Langmuir probe data from each mode and during a transition, a set of criteria, based on the plasma characteristics, were established to predict the operating mode for this ICP. Results will be presented for plasmas generated under various conditions.
Keywords :
Langmuir probes; plasma density; plasma instability; plasma pressure; plasma probes; RF coil; RF power; RF pulse; atomic gas; band filters; capacitive mode; capacitively coupled mode; current probes; electron temperature; gas mixture; gas pressure; inductive mode; low pressure repetitively pulsed RF excited inductively coupled plasma source; mixtures; mode transitions; molecular gas; photomultiplier; plasma density; plasma diagnostics; plasma potential; pulse width; pulsed ICP system; pure gases; time resolved Langmuir probe measurements; time resolved plasma emission; voltage probes; Plasma density; Plasma diagnostics; Plasma measurements; Plasma properties; Plasma sources; Plasma temperature; Probes; Radio frequency; Temperature measurement; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location :
Banff, Alberta, Canada
Print_ISBN :
0-7803-7407-X
Type :
conf
DOI :
10.1109/PLASMA.2002.1030567
Filename :
1030567
Link To Document :
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