Title :
Fluorocarbon film preparation in C/sub 8/F/sub 18/ vapor RF plasma and its electrical properties
Author :
Sakai, Yoshiki ; Biloiu, C. ; Biloiu, I.A. ; Suda, Yoshiyuki
Author_Institution :
Graduate Sch. of Eng., Hokkaido Univ., Sapporo, Japan
Abstract :
Summary form only given. Amorphous polymer films composed of C and F (CF film) have been deposited on metal surfaces in a per-fluorocarbon (C/sub 8/F/sub 18/) vapor RF plasma. The spatial and temporal evolution of the optical emission of CF/sub 2/ and C/sub 2/ radicals was observed and kinetics of a C/sub 8/F/sub 18/ decomposition process was discussed. The films were deposited on Al and Cu electrodes at room temperature with a flow rate of 50 sccm keeping a C/sub 8/F/sub 18/ pressure of 0.4 Torr and an Ar pressure of 0.04 Torr. The electrode arrangements were parallel plates, and concentric solid sphere mesh sphere electrodes. Electrical properties of the film such as, the breakdown voltage V, dielectric constant and the binding structure of the CF films were analyzed with Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy techniques and scanning electron microscopy.
Keywords :
Fourier transform spectra; X-ray photoelectron spectra; organic compounds; permittivity; plasma diagnostics; plasma materials processing; scanning electron microscopy; thin films; 0.04 torr; 0.4 torr; 298 K; Al electrodes; C/sub 8/F/sub 18/ vapor RF plasma; Cu electrodes; Fourier transform infrared spectroscopy; X-ray photoelectron spectroscopy; amorphous polymer films; binding structure; concentric solid sphere; dielectric constant; electrical properties; fluorocarbon film preparation; mesh sphere electrodes; optical emission; parallel plates; room temperature; scanning electron microscopy; Amorphous materials; Argon; Electrodes; Kinetic theory; Optical films; Optical polymers; Plasma temperature; Polymer films; Radio frequency; Stimulated emission;
Conference_Titel :
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location :
Banff, Alberta, Canada
Print_ISBN :
0-7803-7407-X
DOI :
10.1109/PLASMA.2002.1030598
