Title :
Electron transport and thermoelectric response of Nb- or La-doped SrTiO3 epitaxial film at high-temperature
Author :
Ohta, Shingo ; Nomura, Takashi ; Ohta, Hiromichi ; Hirano, Masahiro ; Hosono, Hideo ; Koumoto, Kunihito
Author_Institution :
Graduate Sch. of Eng., Nagoya Univ., Japan
Abstract :
To clarify the potential of n-type conductive SrTiO3 as a high temperature thermoelectric material, carrier concentration dependence of the thermoelectric figure of merit, ZT of SrTiO3 at high-temperature (1000 K) is clarified using heavily Nb- or La-doped SrTiO3 epitaxial films, which were grown on insulating (100)-oriented LaAlO3 single-crystalline substrates by a pulsed-laser deposition method. Carrier concentration, Hall mobility, Seebeck coefficient and thermal conductivity of Nb- or La-doped SrTiO3 epitaxial films were experimentally evaluated at 1000 K with an aid of theoretical analysis. The maximum ZT value was obtained ZT = 0.37 for 4 × 1021 cm-3 Nb-doped SrTiO3 at 1000 K, which is the largest value among n-type oxide semiconductors ever reported.
Keywords :
Hall mobility; Seebeck effect; carrier density; high-temperature effects; lanthanum; niobium; pulsed laser deposition; semiconductor doping; semiconductor epitaxial layers; semiconductor growth; strontium compounds; thermal conductivity; 1000 K; Hall mobility; La-doped SrTiO3 epitaxial film; LaAlO3; Nb-doped SrTiO3 epitaxial film; Seebeck coefficient; SrTiO3:La; SrTiO3:Nb; carrier concentration; electron transport; high temperature thermoelectric material; insulating (100)-oriented LaAlO3 single-crystalline substrates; n-type conductive SrTiO3; n-type oxide semiconductors; pulsed-laser deposition; thermal conductivity; thermoelectric figure-of-merit; thermoelectric response; Collaboration; Conducting materials; Conductive films; Electrons; Postal services; Power generation; Substrates; Temperature; Thermal conductivity; Thermoelectricity;
Conference_Titel :
Thermoelectrics, 2005. ICT 2005. 24th International Conference on
Print_ISBN :
0-7803-9552-2
DOI :
10.1109/ICT.2005.1519914