• DocumentCode
    2213593
  • Title

    High-power helium inductively coupled plasma source for elemental analysis

  • Author

    Okino, A. ; Miyahara, Hidekazu ; Yabuta, H. ; Hayashi, Yasuhiro ; Watanabe, Manabu ; Hotta, E.

  • Author_Institution
    Dept. of Energy Sci., Tokyo Inst. of Technol., Yokohama, Japan
  • fYear
    2002
  • fDate
    26-30 May 2002
  • Firstpage
    309
  • Abstract
    Summary form only given. The argon inductively coupled plasma (ICP) has been successfully used as an ion source for mass spectrometry (ICPMS) and an excitation source for atomic emission spectrometry (ICP-AES). However, the use of argon as a plasma gas has some limitations. Especially, the argon ICP does not exhibit efficient performance for higher ionization energy elements such as nonmetals, rare gases and halogens. To overcome this problem, helium ICP has been developed. Because the ionization energy of helium (24.6 eV) is higher than that of argon (15.8 eV), the use of helium ICP has a potential of enhancing the degree of excitation and ionization for every element. The reported electron number density of 1.5 kW argon and 700 W helium ICP were 3/spl times/10/sup 15/ and 0.7/spl times/10/sup 14/ cm/sup -3/, respectively. To improve the excitation and ionization ability of helium ICP, it is necessary to increase the electron number density. For this purpose, high-power drive is effective method but it was difficult to generate helium plasma with high RF power (>1 kW) because of melting of the quartz glass torch. In this study, we manufactured and tested a gas-cooled helium ICP torch. It has two coaxial quartz glass tubes and the coolant gas flows between the tubes. At the downstream, outside of the torch, the coolant gas surrounds the plasma and prevents the plasma from mixing with atmospheric gas. For the coolant gas, argon, helium and air was tested. With air cooling, it was able to generate a stable helium plasma at RF power of 2 kW. The result of spectroscopic measurements, include the electron number density and the excitation temperature, were presented at the conference.
  • Keywords
    atomic emission spectroscopy; helium; ionisation potential; plasma applications; plasma sources; plasma torches; 1.5 kW; 2 kW; 24.6 eV; 700 W; RF power; air cooling; argon inductively coupled plasma; atomic emission spectrometry; coaxial quartz glass tubes; coolant gas; electron number density; elemental analysis; excitation source; excitation temperature; gas-cooled helium ICP torch; high-power drive; high-power helium inductively coupled plasma source; ion source; ionization energy; mass spectrometry; plasma gas; plasma mixing; quartz glass torch; stable helium plasma generation; Argon; Coolants; Electrons; Helium; Ionization; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources; Plasma stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
  • Conference_Location
    Banff, Alberta, Canada
  • Print_ISBN
    0-7803-7407-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2002.1030632
  • Filename
    1030632