DocumentCode
2213707
Title
Biological ion implantation facility
Author
Sangyuenyongpipat, S. ; Yu, L.D. ; Tondee, N. ; Wattanavatee, K. ; Vilaithong, T. ; Thongleurm, C. ; Phanchaisri, B.
Author_Institution
Dept. of Phys., Chiang Mai Univ., Thailand
fYear
2002
fDate
26-30 May 2002
Firstpage
310
Abstract
Summary form only given. Ion beam bombardment for the surface modification of biomedical substrates is experiencing rapid growth as a tool for improving and controlling the biocompatibility of materials in a number of ways. Ion bombardment of living biological tissue of various kinds is a related research field with some potentially far-reaching applications. For example, in recent work (Anuntalabhochai et al, 2001) we have demonstrated ion beam induced DNA transfer into living E. coli cells. A critical part of the experimental procedure has to do with the fact that the object being bombarded is live, and for most experimental purposes is required to survive both the vacuum exposure and the ion beam bombardment. This in turn places some constraints on the ion beam bombardment facility and the experimental procedures that are not normally of concern in the usual case of ion implantation into non-living materials. Here we describe an ion beam facility that has been designed and made at Chiang Mai University for specific application for the bombardment of living sample materials. The experimental part of the beam line is vertical for convenient manipulation of biological samples. The target chamber can be pumped down quickly for maintaining sample viability. Ion species available include both gaseous and solid species; beam energy is variable up to 30 keV, and beam current up to hundreds of microamperes can be achieved. The application terminal is to be equipped with a beam sweeper, an AFM (atomic force microscope) load-lock chamber for in situ surface measurements, and a TOF-SIMS (time-of-flight secondary ion mass spectrometer) system for surface sputtering studies. The beam emittance and optics have been characterized. The facility is located within a bio-clean room. Here we outline some of the unique design considerations addressed, and summarize the device performance.
Keywords
biological techniques; biomedical materials; ion implantation; 30 keV; E. coli cells; atomic force microscope; beam current; beam em ittance; beam energy; beam induced DNA transfer; beam line; beam optics; beam sweeper; bio-clean room; biocompatibility; biological ion implantation facility; biomedical substrates; device performance; gaseous species; in situ surface measurements; ion beam bombardment; living biological tissue; load-lock chamber; nonliving materials; solid species; surface modification; surface sputtering; target chamber; time-of-flight secondary ion mass spectrometer; vacuum exposure; Atomic force microscopy; Atomic measurements; Biological materials; Biological tissues; Biomedical materials; DNA; Force measurement; Ion beams; Ion implantation; Optical beams;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location
Banff, Alberta, Canada
Print_ISBN
0-7803-7407-X
Type
conf
DOI
10.1109/PLASMA.2002.1030634
Filename
1030634
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