Title :
Wettability and other properties of amorphous hydrogenated carbon (a-C:H) films for biomedical applications synthesized by plasma immersion ion implantation - deposition (PIII-D)
Author :
Yang, P. ; Chen, J.Y. ; Leng, Y.X. ; Wang, J. ; Wan, G.J. ; Huang, N. ; Leng, Y. ; Chu, P.K.
Author_Institution :
Dept. of Mater. Eng., Southwest Jiaotong Univ., Chengdu, China
Abstract :
Summary form only given. Hydrogenated amorphous carbon films (a-C:H) are fabricated on silicon [100] wafers at room temperature using plasma immersion ion implantation - deposition (PIII-D). By adjusting the deposition conditions and annealing parameters (in vacuum between 400-700/spl deg/C), a series of a-C:H films with different hydrogen contents, structures, and chemical bonds are obtained. The film chemistry is investigated using micro-Raman spectroscopy. The surface morphology of the films is characterized using the atomic force microscopy (AFM). The composition is measured by Rutherford backscattering spectrometry (RBS) and elastic recoil detection (ERD). Fourier transform infrared spectroscope (FTIR) is utilized to characterize the bonding characteristics of hydrogen to carbon in the a-C:H films. The wettability of the films is investigated by contact angle measurements with different well-known liquids and physiological solutions. The surface energy and its polar and dispersive part are determined. The experimental results are used to study the influence of the different composition and structure on the wettability of the a-C:H films, a parameter that is crucial to biomedical applications.
Keywords :
Fourier transform spectra; Rutherford backscattering; amorphous state; annealing; atomic force microscopy; biomedical materials; carbon; hydrogen; infrared spectra; plasma deposited coatings; plasma immersion ion implantation; wetting; 400 to 700 C; C:H; Fourier transform infrared spectroscopy; Rutherford backscattering spectrometry; a-C:H film structures; amorphous hydrogenated carbon films; annealing parameters; biomedical applications; bonding characteristics; chemical bonds; contact angle measurements; deposition conditions; dispersive surface energy; elastic recoil detection; film chemistry; film surface morphology; hydrogen contents; liquids; micro-Raman spectroscopy; physiological solutions; plasma immersion ion implantation-deposition; polar surface energy; vacuum; wettability; Amorphous materials; Atomic force microscopy; Biomedical measurements; Hydrogen; Infrared spectra; Plasma immersion ion implantation; Plasma properties; Semiconductor films; Spectroscopy; Surface morphology;
Conference_Titel :
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location :
Banff, Alberta, Canada
Print_ISBN :
0-7803-7407-X
DOI :
10.1109/PLASMA.2002.1030639