Title :
Frequency, pressure, and dimensional scaling of microfabricated inductively coupled plasma sources
Author :
Iza, Felipe ; Hopwood, Jeffrey
Author_Institution :
Northeastern Univ., Boston, MA, USA
Abstract :
Summary form only given, as follows. We are particularly interested in using miniaturized inductively coupled plasmas for the same reasons that large-scale ICPs are commonly used, namely, high plasma generation efficiency and electrodeless operation. In this work, the microfabrication of several miniature ICP configurations is described and the scaling laws that govern the shrinking of ICPs are elucidated.
Keywords :
plasma materials processing; plasma pressure; plasma sheaths; plasma sources; plasma temperature; 400 mtorr; 700 MHz; dimensional scaling; effective plasma length; electrodeless operation; electron temperature; frequency; high plasma generation efficiency; microfabricated ICP sources; plasma generators miniaturization; plasma sheath thickness; power transfer efficiency; pressure; scaling laws; shrinking; transformer model; Coils; Couplings; Frequency; Large-scale systems; Plasma chemistry; Plasma density; Plasma measurements; Plasma sheaths; Plasma sources; Plasma temperature;
Conference_Titel :
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location :
Banff, Alberta, Canada
Print_ISBN :
0-7803-7407-X
DOI :
10.1109/PLASMA.2002.1030679
