DocumentCode
2214904
Title
Development of pair-ion plasma source using fullerenes
Author
Oohara, W. ; Kobayashi, M. ; Hatakeyama, R.
Author_Institution
Dept. of Electron. Eng., Tohoku Univ., Sendai, Japan
fYear
2002
fDate
26-30 May 2002
Firstpage
337
Abstract
Summary form only given, as follows. In relation to dusty plasmas, general attention has recently been paid to plasmas including negative ions with masses much more heavier than those of positive ions. On the other hand, special interest is focused on plasmas consisting of charged particles with an equal mass, such as two-species electron-positron plasma and fine particle plasma produced by photo-ionization. In this study, our attention is concentrated on the steady state generation of a pair-ion plasma consisting of only positive and negative ions with equal mass using fullerenes and the investigation of various basic plasma phenomena which are different from ordinary plasmas. The fullerene (C/sub 60/) is adopted as a candidate for the ion source in order to realize this pair-ion plasma, because the fullerene of a stable cage is easily charged negatively and positively. In case of application, this pair-ion plasma will be used for selectively creating all-carbon fullerene dimers of dumbbell-like structures, which are derived directly from carbon allotropes. This method is quite different from current ones, accompanied by stepwise procedures in solid- or solution-phase reactions using catalysts or nonallotropic fullerene derivatives.
Keywords
dusty plasmas; electron attachment; electron impact ionisation; fullerenes; negative ions; plasma sources; positive ions; C/sub 60/; all-carbon fullerene dimers; annular hole; downstream region; dumbbell-like structures; dusty plasmas; electron-impact ionization; equal mass; fullerene ion source; low energy electron attachment; negative ions; pair-ion plasma source; positive ions; stable cage; steady state generation; sublimated fullerene vapor; Cathodes; Copper; Dusty plasma; Electron beams; Electron emission; Engine cylinders; Plasma applications; Plasma sources; Plasma stability; Plasma temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location
Banff, Alberta, Canada
Print_ISBN
0-7803-7407-X
Type
conf
DOI
10.1109/PLASMA.2002.1030680
Filename
1030680
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