DocumentCode :
2215399
Title :
A new approach to accurate resistivity measurement for a single nanowire - Theory and application
Author :
Wenhua Gu ; Kyekyoon Kim
Author_Institution :
Univ. of Illinois at Urbana-Champaign, Urbana
Volume :
1
fYear :
2006
fDate :
22-25 Oct. 2006
Abstract :
A new four-contact method is proposed to accurately determine the resistivity of a single nanowire and of other nanostructures. Unlike the conventional four-contact method or two-contact method, the new scheme does not require nonrectifying (Ohmic) contacts to the nanowire, and can completely eliminate the systematic errors resulting from the contact resistance or the resistance difference between the contacts. The present method has been successfully applied to a copper nanowire and can be used as a universal resistivity measurement scheme for all nanowires and other nanostructures.
Keywords :
copper; electrical resistivity; nanowires; ohmic contacts; accurate resistivity measurement; contact resistance; copper nanowire; four-contact method; nonrectifying contacts; ohmic contacts; resistance difference; single nanowire; two-contact method; universal resistivity measurement scheme; Application software; Conductivity measurement; Contact resistance; Electrical resistance measurement; Equivalent circuits; Nanostructures; Schottky barriers; Transistors; Voltage; Yarn; four-contact method; nanowire; resitivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
Conference_Location :
Gyeongju
Print_ISBN :
978-1-4244-0540-4
Type :
conf
DOI :
10.1109/NMDC.2006.4388875
Filename :
4388875
Link To Document :
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