DocumentCode :
2215684
Title :
Sensitization of Er by Si-nanoclusters in Erbium doped Si-rich Si nitride films
Author :
Yang, Moon-Seung ; Shin, Jung H. ; Kim, Kyung Joong
Author_Institution :
Dept. of Phys., Korea Adv. Inst. of Sci. & Technol., Daejeon
Volume :
1
fYear :
2006
fDate :
22-25 Oct. 2006
Firstpage :
532
Lastpage :
533
Abstract :
Er3+ luminescent properties from Erbium doped Si-rich Si nitride (SRSN) films were investigated through photoluminescence (PL) and photoluminescence excitation spectroscopy (PLE). These films grown by ultra-high vacuum ion beam sputtering are annealed at high temperature in order to form the Si-nanoclusters (nc-Si). We find that nc-Si can act as efficient sensitizers for Er3+, displaying the strong energy transfer form nc-Si to Er ions. Er3+ luminescence lifetimes were in the 1-3 msec range at room temperature with complete suppression of temperature quenching of Er3+ intensity, indicating high luminescence efficiency as well. The PLE spectrum in film with nc-Si shows efficient Er3+ PL intensity, compared with that of pure nitride. These results imply that Er doped SRSN is a promising alternative for compact, high-efficiency Si based light sources.
Keywords :
erbium; photoluminescence; quenching (thermal); semiconductor thin films; silicon compounds; sputtering; SiN:Er; SiN:Er - System; luminescence lifetimes; luminescent properties; nanoclusters sensitization; photoluminescence excitation spectroscopy; semiconductor thin films; temperature 293 K to 298 K; temperature quenching; ultra-high vacuum ion beam sputtering; Annealing; Erbium; Ion beams; Luminescence; Photoluminescence; Semiconductor films; Spectroscopy; Sputtering; Temperature distribution; Temperature sensors; Erbium; Si-nanocluster (nc-Si); Si-rich Si nitride (SRSN) photoluminescence (PL);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
Conference_Location :
Gyeongju
Print_ISBN :
978-1-4244-0540-4
Electronic_ISBN :
978-1-4244-0541-1
Type :
conf
DOI :
10.1109/NMDC.2006.4388888
Filename :
4388888
Link To Document :
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