• DocumentCode
    2216051
  • Title

    Physical and technological features of the arc vacuum system for coatings deposition based on the plasma arc accelerator

  • Author

    Semenyuk, Valeriy ; Osipov, Leonid ; Nyi, Nikolay Svavi´ ; Chernolutskiy, Dmitriy ; Gurin, Anatoliy

  • Author_Institution
    Design Eng. Enterprise INTRA Ltd., Kyiv, Ukraine
  • Volume
    2
  • fYear
    1996
  • fDate
    21-26 Jul 1996
  • Firstpage
    871
  • Abstract
    Here the authors present the results of investigations of the space structure and energy parameters of the plasma flow in the vacuum arc system with the sacrificial cathode in the magnetic field which provides confinement of the arc discharge near the end operating cathode surface and the additional acceleration of the plasma flow towards the processed article as well. As a result, under the operating pressure up to 100 Pa the directed flow of the coating material plasma with the maximum energy of the ion component up to 150 eV and with the flow density up to 20 mA/cm2 is formed. The investigated plasma arc accelerator (PAA) allows to produce the high quality coatings with the diminished micro-drops fraction onto metal, dielectric substrates under operating surface temperatures lower than 450 K using the cathodes from the easily melting materials with melting temperatures lower than 2000 K
  • Keywords
    magnetic field effects; melting; plasma arc sprayed coatings; plasma arc spraying; vacuum deposited coatings; vacuum deposition; 100 Pa; 150 eV; arc discharge; arc vacuum system; coatings deposition; dielectric substrates; melting temperatures; plasma arc accelerator; plasma flow; vacuum arc system; Cathodes; Plasma accelerators; Plasma confinement; Plasma density; Plasma materials processing; Plasma temperature; Space technology; Vacuum arcs; Vacuum systems; Vacuum technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
  • Conference_Location
    Berkeley, CA
  • Print_ISBN
    0-7803-2906-6
  • Type

    conf

  • DOI
    10.1109/DEIV.1996.545487
  • Filename
    545487