Title :
Efficiently embedding expertise in high-density process-portable standard cell generators
Author :
Duh, J. ; Matheson, T.G. ; Hepler, E.D.
Author_Institution :
Mentor Graphics Corp., Beaverton, OR, USA
Abstract :
A new approach to the creation of process-portable standard cell generators is described. The system efficiently captures designer expertise while automating the details of the cell layout process. The system takes advantage of the extensibility of the underlying symbolic layout system to provide process portability without sacrificing layout density. The system includes novel transistor-bending and mask-processing automation
Keywords :
VLSI; application specific integrated circuits; cellular arrays; circuit layout CAD; integrated circuit layout; logic CAD; masks; ASIC; VLSI; cell layout process; cell-based design; layout density; layout design automation; mask-processing automation; process-portable standard cell generators; symbolic layout system; transistor-bending process; Application specific integrated circuits; Compaction; Design automation; Design methodology; Fabrication; Graphics; Layout; Libraries; Manuals; Very large scale integration;
Conference_Titel :
Custom Integrated Circuits Conference, 1996., Proceedings of the IEEE 1996
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-3117-6
DOI :
10.1109/CICC.1996.510605
