DocumentCode :
2216690
Title :
The development of the nanocrystal silicon film FEA pressure sensor
Author :
Jinhua, Liu ; Hongyi, Lin ; Xing, Zhang
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Volume :
2
fYear :
2001
fDate :
22-25 Oct. 2001
Firstpage :
793
Abstract :
A novel field emission array (FEA) has been fabricated using a new method, which greatly simplifies the whole process. Factors influencing the emitting current of the FEA are analyzed theoretically and nanocrystal silicon films are deposited on the FEA to improve the emitting characteristics due to their excellent conductivity and particular configuration. Emitting characteristics of the FEA with and without nanocrystal silicon films are tested and compared. The design and the main process are proposed.
Keywords :
elemental semiconductors; etching; microsensors; nanostructured materials; pressure sensors; semiconductor thin films; silicon; vacuum microelectronics; Si; anisotropic chemical etching; conductivity; electrostatic bonding; emitting characteristics; emitting current; field emission array; nanocrystal Si film FEA pressure sensor; vacuum microelectronic technology; Anodes; Cathodes; Field emitter arrays; Nanocrystals; Semiconductor films; Sensor phenomena and characterization; Sensor systems and applications; Silicon; Tactile sensors; Temperature sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Print_ISBN :
0-7803-6520-8
Type :
conf
DOI :
10.1109/ICSICT.2001.982014
Filename :
982014
Link To Document :
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