Title :
Fabrication of micromachined infrared thermopile detector using novel front etch process
Author :
Xu, Zhengyi ; Bin Yiong ; Yuelin Wang
Author_Institution :
State Key Lab. of Transducer Technol., Acad. Sinica, Shanghai, China
Abstract :
A novel front etch process is developed to remove bulk silicon and leave a thin membrane as the supporting structure in a thermopile detector. Compared with other bulk micromachining processes, our front etch process has advantages in terms of photolithography, reliability and dehydration operation. Using this technology, an infrared thermopile detector was fabricated.
Keywords :
etching; infrared detectors; micromachining; microsensors; semiconductor device reliability; thermopiles; Si; Si3N4-SiO2; dehydration operation; front etch process; micromachined infrared thermopile detector fabrication; photolithography; reliability; thin membrane supporting structure; Anisotropic magnetoresistance; Biomembranes; Costs; Dielectric substrates; Fabrication; Infrared detectors; Lithography; Semiconductor thin films; Silicon; Wet etching;
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Print_ISBN :
0-7803-6520-8
DOI :
10.1109/ICSICT.2001.982015
