DocumentCode :
2216913
Title :
The sacrificial layer releasing of micro-machined optical-fiber switch with poly-Si torsion mirror
Author :
Liu, Shimei ; Wu, Lin ; Zhang, Guobing ; Zhang, Peiyu ; Dacheng Zhang ; Hao, Yilong ; Li, Ting
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Volume :
2
fYear :
2001
fDate :
22-25 Oct. 2001
Firstpage :
827
Abstract :
The wet etching process is often used in the sacrificial layer releasing of micro-machined optical-fiber switch with poly-Si torsion mirror. After the sacrificial layer release and during wafer drying, however, the surface tension of the flowing liquid produces pulling forces on suspended structure which causes stiction effect and leads to the microstructure losing efficacy. This paper introduces replacement and different wet etching methods to resolve the stiction problem and obtain satisfactory microstructures in the process of release of the sacrificial layer for micromachined optical fiber switch with poly-Si torsion mirrors.
Keywords :
elemental semiconductors; etching; micromachining; microswitches; optical fabrication; optical switches; silicon; micro-machined optical-fiber switch; poly-Si torsion mirror; sacrificial layer; stiction effect; surface tension; wafer drying; wet etching process; Micromechanical devices; Microstructure; Mirrors; Optical fibers; Optical sensors; Optical switches; Substrates; Temperature; Turning; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Print_ISBN :
0-7803-6520-8
Type :
conf
DOI :
10.1109/ICSICT.2001.982023
Filename :
982023
Link To Document :
بازگشت