DocumentCode
2216913
Title
The sacrificial layer releasing of micro-machined optical-fiber switch with poly-Si torsion mirror
Author
Liu, Shimei ; Wu, Lin ; Zhang, Guobing ; Zhang, Peiyu ; Dacheng Zhang ; Hao, Yilong ; Li, Ting
Author_Institution
Inst. of Microelectron., Peking Univ., Beijing, China
Volume
2
fYear
2001
fDate
22-25 Oct. 2001
Firstpage
827
Abstract
The wet etching process is often used in the sacrificial layer releasing of micro-machined optical-fiber switch with poly-Si torsion mirror. After the sacrificial layer release and during wafer drying, however, the surface tension of the flowing liquid produces pulling forces on suspended structure which causes stiction effect and leads to the microstructure losing efficacy. This paper introduces replacement and different wet etching methods to resolve the stiction problem and obtain satisfactory microstructures in the process of release of the sacrificial layer for micromachined optical fiber switch with poly-Si torsion mirrors.
Keywords
elemental semiconductors; etching; micromachining; microswitches; optical fabrication; optical switches; silicon; micro-machined optical-fiber switch; poly-Si torsion mirror; sacrificial layer; stiction effect; surface tension; wafer drying; wet etching process; Micromechanical devices; Microstructure; Mirrors; Optical fibers; Optical sensors; Optical switches; Substrates; Temperature; Turning; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Print_ISBN
0-7803-6520-8
Type
conf
DOI
10.1109/ICSICT.2001.982023
Filename
982023
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