Title :
Pulsed laser deposited LiNi0.5Mn0.5O2 thin films on the Pt(200)/TiO2/SiO2/Si substrates for lithium-ion battery application
Author :
Chung, Junki ; Kim, Wonjung ; Tak, Jinsung ; Lee, Sunggap ; Kim, Cheoljin
Author_Institution :
Changwon Nat. Univ., Changwon
Abstract :
LiNi0.5Mn0.5O2 thin films were deposited on Pt (200)/ SiO2/ Si substrates by pulsed laser deposition (PLD) using solid-state sintered LiNi0.5Mn0.5O2 single-phase target. A KrF laser beam (248 nm) with pulse power of 150 mJ and frequency of 10 Hz was focused to LiNi0.5Mn0.5O2 target. The film was deposited for 20 minutes at 450 ~ 600degC and the deposited LiNi0.5Mn0.5O2 thin films showed only (003) and (104) peaks in the XRD pattern. The average thickness of deposited LiNi0.5Mn0.5O2 thin films was 200 nm with a deposit rate of 10 nm/min.
Keywords :
lithium; pulsed laser deposition; secondary cells; sintering; substrates; thin films; LiNi0.5Mn0.5O2; LiNi0.5Mn0.5O2 - Interface; PLD; Si; Si - Surface; SiO2; SiO2 - Surface; TiO2; TiO2 - Surface; lithium-ion battery application; pulse power; pulsed laser deposition; solid-state sintering; thin films; Laser beams; Laser sintering; Optical pulses; Power lasers; Pulsed laser deposition; Semiconductor thin films; Solid lasers; Solid state circuits; Sputtering; Substrates; GADDS; LiNi0.5Mn0.5O2; Lithium-ion battery; PLD; thin film;
Conference_Titel :
Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
Conference_Location :
Gyeongju
Print_ISBN :
978-1-4244-0541-1
Electronic_ISBN :
978-1-4244-0541-1
DOI :
10.1109/NMDC.2006.4388942
