DocumentCode :
2217418
Title :
High-density optical disk pattern mastering using nanoimprint lithography
Author :
Choi, Choon-Gi
Author_Institution :
IT Convergence & Components Lab. (ICCL), Electron. & Telecommun. Res. Inst. (ETRI), Daejeon
Volume :
1
fYear :
2006
fDate :
22-25 Oct. 2006
Firstpage :
682
Lastpage :
683
Abstract :
We demonstrated nanoimprint lithography for the high-density optical disk pattern mastering. The nickel electroplated optical disk patterns with pit lengths of ~105 nm, ~ 67 nm, and ~ 40 nm on the nanoimprinted optical disk patterns were successfully fabricated. Because of the advanced technology, it has great possibility that the next generation high-density optical disk will be manufactured by nanoimprint lithography mastering technology.
Keywords :
electroplating; nanolithography; optical disc storage; high-density optical disk pattern mastering; nanoimprint lithography; nanoimprinted optical disk patterns; nickel electroplated optical disk patterns; Chromium; Electron beams; Etching; Nanolithography; Nickel; Optical films; Optical scattering; Resists; Silicon; Substrates; disk mastering; electroplating; high-density optical disk; nanoimprint lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
Conference_Location :
Gyeongju
Print_ISBN :
978-1-4244-0540-4
Electronic_ISBN :
978-1-4244-0541-1
Type :
conf
DOI :
10.1109/NMDC.2006.4388960
Filename :
4388960
Link To Document :
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