Title : 
High-density optical disk pattern mastering using nanoimprint lithography
         
        
        
            Author_Institution : 
IT Convergence & Components Lab. (ICCL), Electron. & Telecommun. Res. Inst. (ETRI), Daejeon
         
        
        
        
        
        
        
            Abstract : 
We demonstrated nanoimprint lithography for the high-density optical disk pattern mastering. The nickel electroplated optical disk patterns with pit lengths of ~105 nm, ~ 67 nm, and ~ 40 nm on the nanoimprinted optical disk patterns were successfully fabricated. Because of the advanced technology, it has great possibility that the next generation high-density optical disk will be manufactured by nanoimprint lithography mastering technology.
         
        
            Keywords : 
electroplating; nanolithography; optical disc storage; high-density optical disk pattern mastering; nanoimprint lithography; nanoimprinted optical disk patterns; nickel electroplated optical disk patterns; Chromium; Electron beams; Etching; Nanolithography; Nickel; Optical films; Optical scattering; Resists; Silicon; Substrates; disk mastering; electroplating; high-density optical disk; nanoimprint lithography;
         
        
        
        
            Conference_Titel : 
Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
         
        
            Conference_Location : 
Gyeongju
         
        
            Print_ISBN : 
978-1-4244-0540-4
         
        
            Electronic_ISBN : 
978-1-4244-0541-1
         
        
        
            DOI : 
10.1109/NMDC.2006.4388960