• DocumentCode
    2217668
  • Title

    Influence Of Bicmos Processing On Thin Gate Oxide Quality

  • Author

    Whiston, Seamus

  • Author_Institution
    Rameen Industrial Estate
  • fYear
    1993
  • fDate
    24-27 Oct 1993
  • Firstpage
    229
  • Lastpage
    233
  • Keywords
    BiCMOS integrated circuits; Breakdown voltage; Brushes; CMOS process; Capacitors; Design for quality; Inorganic materials; Manufacturing processes; Resistors; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 1993 International
  • Type

    conf

  • DOI
    10.1109/IRWS.1993.666322
  • Filename
    666322
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2217668