• DocumentCode
    2217964
  • Title

    Energy-gap and electron-affinity contractions and their importance in bipolar device simulators

  • Author

    Lindholm, Fred A. ; Wu, Ben S.

  • Author_Institution
    Dept. of Electr. Eng., Florida Univ.,, Gainesville, FL, USA
  • fYear
    1988
  • fDate
    12-13 Sep 1988
  • Firstpage
    191
  • Lastpage
    194
  • Abstract
    Simulations using bipolar device simulators show that moderate injection can exist in heavily doped portions of a transistor base and that very high injection can exist throughout a current-extended or pushed out part of a quasineutral base layer of a high-speed digital device. Physical models now in bipolar device simulators neglect the dependence of the effective intrinsic density and the corresponding effective energy-gap contraction on high concentrations of mobile electrons and holes. Further they assume that the conduction-band and valence-band shifts are equal in magnitude and thus equal to half of the magnitude of the generalized electron-affinity contraction. New results from experiment and theory demonstrate the incompleteness of these physical models, and the engineering significance of this incompleteness is assessed
  • Keywords
    bipolar transistors; carrier density; conduction bands; electron affinity; energy gap; semiconductor device models; valence bands; bipolar device simulators; carrier density; conduction band shift; electron-affinity contractions; energy-gap contraction; heavily doped portions; high-speed digital device; mobile electrons; mobile holes; models; transistor base; valence-band shifts; Ballistic transport; Bipolar transistors; Charge carrier processes; Delay; Differential equations; Electron mobility; Partial differential equations; Semiconductor devices; Semiconductor process modeling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar Circuits and Technology Meeting, 1988., Proceedings of the 1988
  • Conference_Location
    Minneapolis, MN
  • Type

    conf

  • DOI
    10.1109/BIPOL.1988.51076
  • Filename
    51076