DocumentCode
2219807
Title
Ion energy measurements in vacuum arc deposition
Author
Yang, Lei ; Zou, Jiyan ; Cheng, Zhongyuan ; Liang, Xiuli
Author_Institution
Dept. of Electr. Eng., Huazhong Univ. of Sci. & Technol., Wuhan, China
Volume
2
fYear
1996
fDate
21-26 Jul 1996
Firstpage
937
Abstract
This paper introduces a Faraday-cup system used to measure the ion energy in vacuum arc deposition. The pressure and current dependence of the ion energy, as well as its angular distribution are presented. Further, the combined ion parameter Ep is investigated. Under the condition of 100 A, 0.66 Pa, -100 V, the typical maximum ion energy is 75 eV, the value of Ep is 828 eV/atom
Keywords
energy measurement; ions; plasma deposition; plasma diagnostics; vacuum deposition; -100 V; 0.66 Pa; 100 A; 75 eV; Faraday-cup system; angular distribution; combined ion parameter; current dependence; ion energy measurements; plasma deposition; pressure dependence; vacuum arc deposition; Cathodes; Coatings; Elementary particle vacuum; Energy measurement; Orifices; Plasma diagnostics; Plasma measurements; Plasma properties; Tin; Vacuum arcs;
fLanguage
English
Publisher
ieee
Conference_Titel
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location
Berkeley, CA
Print_ISBN
0-7803-2906-6
Type
conf
DOI
10.1109/DEIV.1996.545502
Filename
545502
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