Title :
Deposition of superhard amorphous carbon films by pulsed arc sources
Author :
Scheibe, H.-J. ; Schultrich, B. ; Ziegele, H. ; Siemroth, P.
Author_Institution :
Fraunhofer-Inst. fur Werkstoffphys. und Schichttechnol., Dresden, Germany
Abstract :
Hydrogen-free amorphous carbon films with hardness comparable to crystalline superhard materials have been deposited by special pulsed arc techniques. By the combination of very high hardness, low adhesion and high smoothness, these films show superior behaviour in wear and glide applications. The influence of plasma and deposition conditions on these film properties and the choice of optimum conditions are discussed
Keywords :
carbon; plasma CVD coatings; thin films; wear resistant coatings; crystalline superhard materials; deposition conditions; film properties; glide applications; high smoothness; hydrogen-free amorphous carbon films; low adhesion; plasma conditions; pulsed arc sources; superhard amorphous carbon films; vacuum deposition; very high hardness; wear applications; Adhesives; Amorphous materials; Coatings; Crystalline materials; Crystallization; Hydrogen; Plasma measurements; Plasma properties; Plasma temperature; Vacuum arcs;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-2906-6
DOI :
10.1109/DEIV.1996.545503
