DocumentCode
2220211
Title
High-voltage gallium arsenide step recovery diodes
Author
Rozhkov, A.V. ; Korolkov, V.I.
Author_Institution
A.F. Ioffe Phys. Tech. Inst., St. Petersburg, Russia
Volume
2
fYear
2001
fDate
22-25 Oct. 2001
Firstpage
1340
Abstract
Experimental results for high-voltage GaAs step recovery diodes (SRDs) are presented in the paper. All of diodes have been developed for the intended application of waveshaping in pulse generators and fabricated by liquid-phase epitaxy technology. SRDs operate primarily due to charge storage with pulsed forward biasing and have a sharp reverse recovery transient. Diode switching times as low as 400 ps were demonstrated for a 800 V transient into 50 Ω load. This result was compared to experimental results obtained elsewhere and satisfied the fastest switching speed for SRDs with a few hundreds volts of operating voltage. It is shown that even with inherently lower carrier lifetimes GaAs might be considered as alternative material for SRDs. Furthermore, GaAs SRDs offer shortest delay time (compare to high voltage Si DSRDs) for triggering pulse which highly desirable in some pulse generation circuits.
Keywords
III-V semiconductors; charge storage diodes; gallium arsenide; semiconductor device measurement; 400 ps; 50 ohm; 800 V; GaAs; charge storage diodes; diode switching times; high-voltage GaAs SRDs; high-voltage gallium arsenide step recovery diodes; liquid-phase epitaxy technology; pulse generators; triggering pulse delay time; waveshaping; Charge carrier lifetime; Circuits; Doping; Epitaxial growth; Gallium arsenide; P-i-n diodes; Pulse generation; Semiconductor diodes; Switches; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Print_ISBN
0-7803-6520-8
Type
conf
DOI
10.1109/ICSICT.2001.982150
Filename
982150
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