A model of thin film condensation

Author

Kostiouk, G.I. ; Levchenko, I.G.

Author_Institution

Dept. of Physicotechnol. Basis of Structural Mater. Machining, Kharkov Aviation Inst.

Volume

2

fYear

1996

fDate

21-26 Jul 1996

Firstpage

946

Abstract

A model of thin film condensation have been developed to investigate the film growth regularity and calculate the most important characteristics of thin coating, such as microhardness, roughness, porosity etc. Our model allows calculation of film structure and defines the above-mentioned characteristics. Besides, the model is suitable for calculation of the conditions needed for a film to have a certain structure. The model takes into account all the most important processes on the surface. Some very interesting results were obtained by means of computing experiments

Keywords

film condensation; microhardness; phase transformations; surface topography; thin films; film structure; microhardness; porosity; roughness; surface processes; thin film condensation model; thin film growth regularity; Adhesives; Atomic measurements; Dielectrics and electrical insulation; Differential equations; Elementary particle vacuum; Lattices; Rough surfaces; Surface discharges; Surface roughness; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on

Conference_Location

Berkeley, CA

Print_ISBN

0-7803-2906-6

Type

conf

DOI

10.1109/DEIV.1996.545504

Filename

545504