DocumentCode :
2220473
Title :
High Energy Laser Pulse Irradiation of a Silica Microsphere on a Glass Surface for Sub-micron Patterning
Author :
Kane, D.M. ; Joyce, A.M.
Author_Institution :
Dept. of Phys., Macquarie Univ., Sydney, NSW
fYear :
2006
fDate :
3-7 July 2006
Abstract :
Irradiating silica microspheres, on a silica or glass surface, with single, high-energy, laser pulses from a KrF excimer laser, has generated a wealth of different micron and sub-micron, topological patterns in the substrate. Optical surface profilometry has been used as the experimental technique to study the patterns formed. Comparison of the experimental results with theoretical results from sophisticated models developed by Lukyanchuk and co-workers, and Arnold and co-workers is presented.
Keywords :
krypton compounds; laser materials processing; nanopatterning; silicon compounds; KrF; SiO2; excimer laser; glass surface; laser pulse irradiation; optical surface profilometry; silica microsphere; submicron patterning; Glass; Laser modes; Laser theory; Optical films; Optical interferometry; Optical pulses; Optical scattering; Optical surface waves; Silicon compounds; Surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoscience and Nanotechnology, 2006. ICONN '06. International Conference on
Conference_Location :
Brisbane, Qld.
Print_ISBN :
1-4244-0452-5
Electronic_ISBN :
1-4244-0452-5
Type :
conf
DOI :
10.1109/ICONN.2006.340541
Filename :
4143321
Link To Document :
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