Title :
A new approach for circuit extraction based on overlay graph
Author :
Song, Hua ; Tang, Pushan
Author_Institution :
Dept. of Electron. Eng., Fudan Univ., Shanghai, China
Abstract :
Presents an approach for circuit extraction that considers the physical significance of each overlay in multilayer IC masks. The overlay graph transformed from mask artwork data keeps the topological and geometric information of integrated circuits. The extraction based on the overlay graph implements a transformation from an IC chip layout to a circuit representation suitable for detailed circuit simulation. The approach can be applied to MOS and bipolar IC technologies.<>
Keywords :
MOS integrated circuits; bipolar integrated circuits; circuit CAD; digital simulation; IC chip layout; MOS; bipolar IC; circuit extraction; detailed circuit simulation; mask artwork; multilayer IC masks; overlay graph; Bipolar integrated circuits; Circuit simulation; Circuit synthesis; Data mining; Humans; Integrated circuit interconnections; Integrated circuit layout; Integrated circuit technology; Testing; Voltage;
Conference_Titel :
Circuits and Systems, 1988., IEEE International Symposium on
Conference_Location :
Espoo, Finland
DOI :
10.1109/ISCAS.1988.15202
